Dépôt de couches minces à saut et à gradient d'indice par plasma en résonnance cyclotron.

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Haj ibrahim, Bicher (2007) Dépôt de couches minces à saut et à gradient d'indice par plasma en résonnance cyclotron. Doctorat PICM, EP - LPICM Laboratoire de Physique des Interfaces et Couches Minces, EP/X p.151.

Autres Localisations: http://www.imprimerie.polytechnique.fr/Theses/Files/Haj_Ibrahim.pdf

Table des Matières

-Introduction 1
-Chapter 1 PECVD of Optical Thin Films 5
1.1 Requirements for Optical Thin Film Technology 5
1.1.1 The Design of Optical Thin Films 7
1.1.2 The Theory of Optical Thin Films: The Matrix Formalism 10
1.1.3 Thin Film Deposition 13
1.2 Principles of PECVD: Different Deposition Reactors 15
1.3 Range of Materials in PECVD 18
1.4 Control Techniques for Optical Material Deposition 20
1.4.1 Quartz Crystal Microbalance 20
1.4.2 Single Wavelength and Spectral Reflectometry 21
References 23
-Chapter 2 High Density Plasma Sources 25
2.1 Plasma and Plasma Properties 26
2.2 Microwave Discharges and the ECR Effect 27
2.2.1 The Motion of a Charged Particle in an Electromagnetic Wave 27
2.2.2 The Larmor Radius and the ECR Effect 29
2.3 Low Pressure Microwave Reactors 31
2.3.1 Divergent ECR 32
2.3.2 Microwave Plasma Disk Reactors 33
2.3.3 Distributed ECR 34
2.3.4 Integrated Distributed ECR 35
2.3.5 Matrix Distributed ECR 36
References 38

-Chapter 3 Implementation of an MDECR-PECVD Reactor: VENUS 41
3.1 Description and Construction 42
3.1.1 The Gas Panel, Mass Flow Controllers and Computer Control 45
3.2 Characterization of the Vacuum System and Process Parameter Range 49
3.2.1 Calculation of the Leak Rate and Residence Time 49
3.2.2 Radio Frequency Biasing of the Substrate 52
3.3 ECR Plasma Characterization by Optical Emission Spectroscopy 52
3.3.1 The Influence of SiH4 Flow 56
3.3.2 The Influence of Increased Microwave Power 57
3.3.3 The Influence of Biasing the Substrate 58
3.4. Nature of the Deposition Process in a HDP-PECVD Reactor: Implications for Silica Deposition 59
3.4 Conclusion 62
References 64

-Chapter 4 Deposition of SiOxNy Optical Filters by MDECR-PECVD 67
4.1 Phase Modulated Ellipsometry 68
4.2 Characterization by Spectroscopic Ellipsometry 70
4.3 Characterization by FTIR Spectroscopy 74
4.4 The Influence of the Magnet Matrix Configuration 76
4.5 The Influence of the Applied Microwave Power on SiNx Deposition 81
4.6 The Influence of RF Substrate Biasing 83
4.7 The Feed-forward Deposition of Gradient Optical Filters 88
4.7.1 A Gradient Index AR Coating in the Visible Range 90
4.7.2 Rugate Filter Deposition and Side Lobe Suppression 92
4.7.2.1. Bovard’s model 93
4.7.2.2. Correlation of side lobe suppression between multilayer
and rugate filters 94
4.7.2.3. Comparison between sinusoidal layer and quintic layer 98
4.8 Conclusion 101
References 102

-Chapter 5 Real-Time Control Using Multi-Channel Kinetic Ellipsometry 107
5.1 Kinetic Ellipsometry 108
5.1.1 Kinetic Ellipsometry Calibration 108
5.1.2 Influence of The Plasma Emission 110
5.1.3 Influence Of The Heat Flux onto the Substrate 113
5.2 Methods For Controlling Layer Thickness And Refractive Index 115
5.2.1 Trajectory control methods 115
5.2.1.1 Trajectory Distance Method 116
5.2.1.2 Trajectory Length Method 118
5.2.2 Direct Numerical Inversion Method 118
5.2.3 Real-time Least Square Fit 121
5.3 Examples of Optical Layer Control by Least Square Fit 122
5.3.1 Thickness Control of a Single Layer 122
5.3.2 Thickness Control of Two Layers HL 124
5.3.3 Thickness and Index Control of a Three Layer MHL AR Coating
for the Visible Range 127
5.7 Conclusion 129
References 130
Chapter 6 Summary and Conclusion 131
Appendix I : The Classical Lorentz Oscillator and Tauc-Lorentz Models 135
Appendix II : List of Publications 139
Bibliography 141

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